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Fabrication of mesoporous metal chalcogenide nanoflake silica thin films and spongy mesoporous CdS and CdSe

机译:介孔金属硫族化物纳米片二氧化硅薄膜的制备及海绵状介孔CdS和CdSe的制备

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摘要

Mesoporous silica metal oxide (ZnO and CdO) thin films have been used as metal ion precursors to produce the first examples of mesoporous silica metal sulfide (meso-SiO 2@ZnS, meso-SiO 2@CdS) or silica metal selenide (meso-SiO 2@ZnSe, meso-SiO 2@CdSe) thin films, in which the pore walls are made up of silica and metal sulfide or metal selenide nanoflakes, respectively. A gentle chemical etching with a dilute HF solution of the meso-SiO 2@CdS (or meso-SiO 2@CdSe) produces mesoporous cadmium sulfide (meso-CdS) (or cadmium selenide, meso-CdSe). Surface modified meso-CdS displays bright blue photoluminescence upon excitation with a UV light. The mesoporous silica metal oxides are formed as metal oxide nanoislands over the silica walls through a self-assembly process of a mixture of metal nitrate salt-two surfactants-silica source followed by calcination step. The reactions, between the H 2S (or H 2Se) gas and solid precursors, have been carried out at room temperature and monitored using spectroscopy and microscopy techniques. It has been found that these reactions are: 1) taking place through the diffusion of sulfur or selenium species from the top metal oxide layer to the silica metal oxide interface and 2) slow and can be stopped at any stage to obtain mesoporous silica metal oxide metal sulfide or silica metal oxide metal selenide intermediate thin films. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
机译:介孔二氧化硅金属氧化物(ZnO和CdO)薄膜已用作金属离子前体,以生产介孔二氧化硅金属硫化物(meso-SiO 2 @ ZnS,meso-SiO 2 @ CdS)或二氧化硅金属硒化物(meso- SiO 2 ZnSe,meso-SiO 2 CdSe)薄膜,其孔壁分别由二氧化硅和金属硫化物或金属硒化物纳米薄片组成。用稀的中观SiO 2 @ CdS(或中观SiO 2 @ CdSe)HF溶液进行化学蚀刻会产生中孔硫化镉(meso-CdS)(或硒化镉,中观CdSe)。经表面改性的介孔CdS在被紫外线激发后显示出亮蓝色的光致发光。中孔二氧化硅金属氧化物是通过金属硝酸盐-两种表面活性剂-二氧化硅源的混合物的自组装过程接着煅烧步骤而形成为二氧化硅壁上的金属氧化物纳米岛。 H 2S(或H 2Se)气体与固体前体之间的反应已在室温下进行,并使用光谱学和显微镜技术进行监控。已经发现这些反应是:1)通过硫或硒物质从顶部金属氧化物层到二氧化硅金属氧化物界面的扩散而发生的;和2)缓慢的并且可以在任何阶段被停止以获得介孔二氧化硅金属氧化物。金属硫化物或二氧化硅金属氧化物的金属硒化物中间薄膜。版权所有©2012 WILEY-VCH Verlag GmbH&Co.KGaA,Weinheim。

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